Applied Laser Engineering introduces Twin Track Technology
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Applied Laser Engineering introduces its new Twin Track Technology. This technique provides control of the focused laser beam in two ways: One, by controlling the laser power and two, by controlling the position of the focus beam within each Anilox cell.
This Twin Track approach offers several significant advantages. All parts of a cell can be reached by the focused laser beam and the power of each of these points can be controlled. This means the Energy Density Ceiling is no longer an issue, simply because Twin Track operates close to sharp focus. With Twin Track higher cell volumes can be obtained with a lower depth of engraving. This is because while the focused laser beam is moved around the Anilox cells, the laser power is dynamically changed, thus keeping the cell bottom flatter.